基于单路利特罗型光栅干涉仪的超精密位移测量技术研究

朱宏宇; 吴益泽; 冯婧桐; 林子超; 禹静; 薛栋柏; 邓晓; 程鑫彬

doi:10.12338/j.issn.2096-9015.2023.0304

基于单路利特罗型光栅干涉仪的超精密位移测量技术研究

doi: 10.12338/j.issn.2096-9015.2023.0304

朱宏宇^{1, 2, 3, 4, 5,},
吴益泽⁶,
冯婧桐^{1, 2, 3, 4, 5},
林子超^{1, 2, 3, 4, 5, ,},
禹静⁶,
薛栋柏^{1, 2, 3, 4, 5},
邓晓^{1, 2, 3, 4, 5, ,},
程鑫彬^{1, 2, 3, 4, 5}

1.
同济大学，精密光学工程技术研究所，上海 200092
2.
同济大学，先进微结构材料教育部重点实验室，上海 200092
3.
同济大学，上海市数字光学前沿科学研究基地，上海 200092
4.
同济大学，上海市全光谱高性能光学薄膜器件与应用专业技术服务平台，上海 200092
5.
同济大学，物理科学与工程学院，上海 200092
6.
中国计量大学，计量测试工程学院，杭州 310018

基金项目: 国家重点研发计划项目（2022YFF0605502, 2022YFF0607600）；国家自然科学基金面上项目（62075165）。

详细信息

作者简介:
朱宏宇（2004-），同济大学物理科学与工程学院在读本科生，研究方向：精密位移测量技术，邮箱：2251727@tongji.edu.cn

通讯作者:
林子超（1998-），同济大学精密光学工程技术研究所博士，研究方向：精密位移测量技术、原子光刻技术等，邮箱：zichao@tongji.edu.cn

邓晓（1988-），同济大学精密光学工程技术研究所副教授，研究方向：纳米光栅标准物质、线宽标准物质、超精密测量及校准技术等，邮箱：18135@tongji.edu.cn

中图分类号: TB921
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- 文章访问数: 132
- HTML全文浏览量: 70
- PDF下载量: 35
- 被引次数: 0
出版历程
- 收稿日期: 2023-11-22
- 录用日期: 2023-12-04
- 修回日期: 2023-12-26
- 网络出版日期: 2024-01-06
- 刊出日期: 2024-02-18

Study on Ultra-Precision Displacement Measurement Technique Based on a Single-Path Littrow Grating Interferometer

ZHU Hongyu^{1, 2, 3, 4, 5
,},
WU Yize⁶,
FENG Jingtong^{1, 2, 3, 4, 5},
LIN Zichao^{1, 2, 3, 4, 5
, ,},
YU Jing⁶,
XUE Dongbai^{1, 2, 3, 4, 5},
DENG Xiao^{1, 2, 3, 4, 5
, ,},
CHENG Xinbin^{1, 2, 3, 4, 5}

1.
Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China
2.
MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University, Shanghai 200092, China
3.
Shanghai Frontiers Science Center of Digital Optics, Tongji University, Shanghai 200092, China
4.
Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University, Shanghai 200092, China
5.
School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
6.
College of Metrology and Testing Engineering, China Jiliang University, Hangzhou 310018, China

摘要

摘要: 基于光栅干涉仪的超精密位移测量技术是先进制造领域的关键共性技术，采用更高刻线密度的光栅是提升光栅干涉仪测量精度与分辨率的有效途径。随着电子束制备光栅技术的提升，采用电子束加工高刻线密度光栅（大于3000线/mm）作为测量基准是优化干涉仪性能的有效途径。利用3333线/mm的高刻线密度电子束直写光栅，采用单路利特罗光栅干涉构型，搭建了原始信号周期为300nm的光栅干涉仪，验证了其在位移测量方面的准确性与稳定性。单路利特罗光栅干涉仪与激光干涉仪比对装置为后续光栅间距标定提供了新的可能性，是电子束直写型高刻线密度光栅在精密位移测量领域的有益探索。
- 计量学 /
- 精密位移测量 /
- 光栅干涉仪 /
- 电子束直写光栅 /
- 激光干涉仪 /
- 利特罗衍射
Abstract: Ultra-precision displacement measurement technology, utilizing grating interferometers, is pivotal in the field of advanced manufacturing. Employing gratings with higher line densities is a proven method to enhance the accuracy and resolution of these interferometers. Advances in electron beam lithography for grating fabrication have enabled the use of high line density gratings (exceeding 3000 lines/mm) as measurement standards, significantly optimizing interferometer performance. This research employs a high line density electron beam direct-write grating with 3333 lines/mm in a single-path Littrow configuration. The interferometer, characterized by a base signal period of 300 nm, showcases its accuracy and stability in displacement measurement. The comparative setup between this single-path Littrow grating interferometer and a laser interferometer opens new avenues for grating pitch calibration. This study marks a valuable exploration in precision displacement measurement using electron beam direct-write high line density gratings.
- metrology /
- precision displacement measurement /
- grating interferometer /
- electron beam direct-write grating /
- laser interferometer /
- Littrow diffraction

HTML全文

图 1 衍射光栅Doppler频移原理图

Figure 1. Doppler shift principle of diffraction grating

下载: 全尺寸图片幻灯片

图 2 单路利特罗结构测量原理示意图

Figure 2. Schematic diagram of the single-path Littrow structure measurement principle

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图 3 单路利特罗位移测量装置实物图

Figure 3. Physical diagram of the single-path Littrow displacement measuring device

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图 4 原始信号辨向特征

Figure 4. Orientation characteristics of the original signal

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图 5 激光干涉仪与单路利特罗光栅干涉仪位移测量结果比对图

Figure 5. Comparison of displacement measurement results between laser interferometer and single-path Littrow grating interferometer

下载: 全尺寸图片幻灯片

表 1 重复定位精度结果

Table 1. Results of repeated positioning accuracy

序号	光栅干涉仪/nm	F-P激光干涉仪/nm
序号	正向	正向
1	24936.29	24955.00
2	24945.77	24960.00
3	24941.77	24953.00
4	24938.16	24962.00
5	24942.97	24956.00
6	24941.68	24964.00
7	24938.64	24967.00
8	24950.19	24950.00
9	24932.80	24952.00
10	24935.95	24965.00
平均位移	24940.42	24958.50
重复测量精度	5.14	6.02

下载: 导出CSV

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