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Metrological Space of Atomic-Scale Scanning Probe Microscopy under the SI Unit Redefinition
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摘要: 2018年第26届国际计量大会建议采用硅{220}晶面间距作为米定义的复现方法之一，以满足不断缩小的物理尺寸对原子级准确度计量的需求。目前能直接表征硅晶格的仪器主要有X射线衍射仪、透射电子显微镜和扫描探针显微镜。简要介绍了硅晶格常数溯源方式在不同测量原理下的国内外应用和发展现状。针对扫描探针显微术，根据不同种类扫描探针显微镜的测量原理，主要综述了扫描隧道显微镜、原子力显微镜和qPlus原子力显微镜在原子尺度水平和垂直维度下的空间计量校准及其应用前景。硅晶格常数作为SI单位变革的重要内容，开展基于硅晶格常数的扫描探针显微技术计量研究，将助力我国新一代纳米计量体系的建立，提升我国在纳米计量领域的国际地位和话语权。Abstract: The 26th General Conference on Weights and Measures (CGPM) in 2018 recommended the silicon {220} lattice spacing as one of the realization methods for the definition of the metre, to meet the demand for atomic-level accuracy measurements as physical dimensions continue to shrink. Currently, the main instruments that can directly characterize the silicon lattice include X-ray diffractometers (XRD), transmission electron microscopes (TEM), and scanning probe microscopes (SPM). This paper briefly introduces the domestic and international application and development status of silicon lattice constant traceability methods under different measurement principles. Focusing on scanning probe microscopy, according to the measurement principles of different types of scanning probe microscopes, the spatial metrological calibration and application prospects of scanning tunneling microscopes (STM), atomic force microscopes (AFM), and qPlus atomic force microscopes (qPlus-AFM) at the atomic scale in both lateral and vertical dimensions are summarized. As an important part of the SI unit redefinition, conducting metrological research on scanning probe microscopy techniques based on the silicon lattice constant will help establish a new generation of nanometrological systems in China and enhance China's international status and voice in the field of nanometrology.
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Key words:
- metrology /
- silicon lattice constant /
- scanning probe microscopy /
- SI unit redefinition /
- atomic scale /
- nanometrology
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图 1 基于XRD技术研制的X射线晶格比较仪
Figure 1. X-ray lattice comparator developed based on XRD technology
图 2 TEM中基于硅晶格常数的线宽测量原理和溯源至硅晶格常数的22 nm和45 nm线宽标准器
Figure 2. Line width measurement principle based on silicon lattice constant in TEM; 22 nm and 45 nm line width standards traceable to the silicon lattice constant
图 3 扫描隧道显微镜（STM）工作原理示意图
Figure 3. Schematic diagram of the working principle of scanning tunneling microscope (STM)
图 4 原子力显微镜（AFM）工作原理示意图
Figure 4. Schematic diagram of the working principle of atomic force microscope (AFM)
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