基于光栅干涉仪的纳米位移台校准方法研究

    Study on the Calibration Method of Nano-Positioning Stages Using Grating Interferometers

    • 摘要: 随着集成电路制造关键尺寸向着5 nm的节点迈进,我国集成电路检测设备产业化的呼声剧增,纳米位移台作为集成电路制造、超精密加工、精密科学仪器制造等领域检测设备的关键器件,研究人员对其重复定位精度、线性度的要求越来越高。光栅干涉仪以光栅作为标准物质溯源到长度基准,因其对环境因素的变化不敏感、抗干扰能力强、稳定性高的优点,成为微纳检测设备产业化的新方向。采用基于标准物质的光栅干涉仪,针对纳米位移台的重复定位精度、线性度分别设计了不同的校准方案,并通过实验验证方案的可行性,最后对该校准方法的测量不确定度和溯源性进行了分析,可以看出设计的校准方案测量稳定、溯源链短。

       

      Abstract: As the critical dimensions in integrated circuit manufacturing approach the 5nm node, the demand for the industrialization of integrated circuit testing equipment has surged. The nano-positioning stage, a pivotal component in semiconductor manufacturing, ultra-precision machining, and precision instrument manufacturing, is experiencing increasingly stringent demands for its repetitive positioning accuracy and linearity. The grating interferometer, which leverages the pitch of the grating as a reference material for measurement, showcases remarkable environmental resilience and superior stability. This makes the grating interferometer an emerging trend in the industrialization of macro-nano measurement equipment. This study presents a calibration method for the nano-positioning stage using a grating interferometer. The feasibility of this method is confirmed through experimental validations. Furthermore, an in-depth analysis of the measurement uncertainty and traceability chain is conducted, highlighting the robustness and shortened traceability path of the proposed calibration approach.

       

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