Abstract: Micro-nano positioning technology is one of the key technologies in the field of cutting-edge science and engineering, with displacement calibration of micro-nano positioning platforms playing a crucial role in precision measurement. The National Institute of Metrology, China, has developed a dual traceability chain metrology standard device for micro-nano displacement positioning calibration and established it as a national metrology standard. The device comprises a laser interferometry-based micro-nano displacement positioning calibration system and a grating diffraction interferometry-based micro-nano displacement positioning calibration system. The laser interferometry calibration system achieves direct and comprehensive calibration of the micro-nano displacement platform through a six-degree-of-freedom laser interferometer calibration setup. In this traceability chain, the measurement values are traced back to the wavelength standard defined by the meter through the laser interferometer. The grating diffraction interferometry calibration system utilizes a one-dimensional nano-grating reference material, and in its traceability chain, the measurement values are indirectly traced back to the wavelength standard defined by the meter through the grating pitch. The dual traceability chain metrology standard device satisfies the diverse application requirements of micro-nano positioning calibration and enhances the comprehensiveness and reliability of the traceability chain. It ensures high-precision measurements of micro-nano-level displacements in fields such as integrated circuit photolithography and precision assembly of key components in aerospace industries. The establishment of this metrology standard device provides significant technical support for the development of micro-nano positioning technology in China.