多通道光频扫描干涉的主动引导测距研究进展

    Research Progress of Active Guided Ranging Based on Multi-Channel Optical Frequency Scanning Interferometry

    • 摘要: 高端装备制造作为服务支撑航空航天、工业测量和大科学装置等领域发展的关键核心技术,离不开高精度大尺寸绝对距离测量作为技术支撑。光频扫描干涉测距技术凭借其测量量程大、精度高以及能够测量无合作目标等优势,能够有效满足大型高端装备制造的测量和监测需求。然而要实现高精度的光频扫描干涉测距,需要具备纳米级别的大带宽调频能力,要求必须解决调频非线性和光频扫描溯源参考等关键问题。从光频扫描干涉测距技术出发,系统综述了国内外光频扫描非线性校正方法和光频扫描溯源参考技术的研究现状,并总结了中国计量科学研究院在多通道光频扫描干涉主动引导测距技术方面的研究进展,包括原理方法研究、测距系统搭建和技术指标测试等内容,为该技术在大尺寸计量领域的进一步应用提供了坚实的理论依据和实践指导。

       

      Abstract: As a critical core technology supporting the development of aerospace, industrial measurement, and large scientific facilities, advanced equipment manufacturing relies heavily on high-precision, large-scale absolute distance measurement as a fundamental technical requirement. Optical frequency scanning interferometry technology, known for its large measurement range, high precision, and the ability to measure uncooperative targets, effectively meets the measurement and monitoring needs of large-scale advanced equipment manufacturing. However, achieving high-precision optical frequency scanning interferometry necessitates a large bandwidth frequency modulation capability at the nanometer level, which requires resolving key issues such as frequency modulation nonlinearity and traceability references for optical frequency scanning. Starting with an overview of optical frequency scanning interferometry technology, this paper systematically reviews the research status of frequency modulation nonlinearity correction methods and optical frequency scanning traceability reference technologies, both domestically and internationally. It also summarizes the research progress made by the National Institute of Metrology of China in the area of multi-channel optical frequency scanning interferometry active guiding ranging technology. This includes studies on the underlying principles and methods, the development of ranging systems, and the testing of technical performance metrics. The paper provides a robust theoretical foundation and practical guidance for the further application of this technology in large-scale metrology.

       

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