高分辨透射电子显微镜的校准方法

王芳; 施玉书; 周莹

doi:10.12338/j.issn.2096-9015.2022.0244

高分辨透射电子显微镜的校准方法

doi: 10.12338/j.issn.2096-9015.2022.0244

王芳^1,,
施玉书^1, ,,
周莹²

1.
中国计量科学研究院，北京 100029
2.
上海市计量测试技术研究院，上海 201203

基金项目: 国家重点研发计划（2020YFF0218403）；中国计量科学研究院基本科研业务费项目(AKYZD2007-1)。

详细信息

作者简介:
王芳（1989-），中国计量科学研究院助理研究员，研究方向：纳米计量，邮箱：wangfang@nim.ac.cn

通讯作者:
施玉书（1982-），中国计量科学研究院副研究员，研究方向：微纳计量技术、精密仪器测量，邮箱：shiys@nim.ac.cn

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出版历程
- 收稿日期: 2022-10-13
- 录用日期: 2022-11-15
- 修回日期: 2022-11-08
- 网络出版日期: 2022-12-01

Research on the Calibration Methods of High-Resolution Transmission Electron Microscopy

WANG Fang^1
,,
SHI Yushu^{1
, ,},
ZHOU Ying²

1.
National Institute of Metrology, Beijing 100029, China
2.
Shanghai Institute of Measurement and Testing Technology, Shanghai 201203, China

摘要

摘要: 透射电子显微镜作为纳米尺度的重要分析工具，其长度量值的准确性将直接影响样品的测量结果。本研究采用单晶硅晶格标准器，对高分辨透射电子显微镜的长度测量误差与长度测量重复性进行了校准，并对长度测量误差的不确定度进行评定。为说明校准方法的适用性，研究中对三台不同型号的高分辨透射电子显微镜进行了校准实验，结果显示该校准方法具有广泛的代表性，可实现透射电子显微镜的精确评价，测量量值可溯源至硅晶格常数，为纳米技术领域的精准测量提供技术保障。
- 硅晶面间距 /
- 高分辨透射电子显微镜 /
- 纳米计量 /
- 溯源性 /
- 校准
Abstract: As an important analytical tool at the nano-scale, the accuracy of the length measurement value of the transmission electron microscopy (TEM) will directly affect the measurement results of samples. In this study, the length measurement error and length measurement repeatability of the high-resolution TEM were calibrated using single-crystal silicon lattice standards, and the uncertainty of the length measurement error was evaluated. To illustrate the applicability of the calibration method, calibration experiments were conducted on three different models of high-resolution TEMs in the study. The results show that the calibration method is widely representative and can achieve an accurate evaluation of TEMs with measured quantities traceable to the silicon lattice constant, which provides technical assurance for accurate measurements in the field of nanotechnology.
- silicon lattice spacing /
- high-resolution transmission electron microscopy /
- nanometrology /
- traceability /
- calibration

HTML全文

图 1 硅晶面间距的高分辨透射电子显微图像

Figure 1. HRTEM images of silicon lattice spacing

下载: 全尺寸图片幻灯片

图 2 硅晶面间距的直接法测量示例

Figure 2. Example of direct measurement of silicon lattice spacing

下载: 全尺寸图片幻灯片

图 3 硅晶面间距的自动化测量示例

Figure 3. Example of automatic measurement of silicon lattice spacing

下载: 全尺寸图片幻灯片

图 4 硅晶面间距的间接法测量示例

Figure 4. Example of indirect measurement of silicon lattice spacing

下载: 全尺寸图片幻灯片

表 1 放大倍率为790 k时不同型号仪器的校准结果

Table 1. Calibration results of different instruments at the magnification of 790 k

仪器型号长度测量误差（%）长度测量重复性（nm）

TECNAI G² F20 1.4 0.01
JEM-2100F −1.2 0.01
LIBRA 200FE 1.3 0.01

下载: 导出CSV

表 2 不同放大倍率对TECNAI G² F20透射电镜的校准结果

Table 2. Calibration results of TEM (TECNAI G² F20) with different magnifications

放大倍率长度测量误差（%）长度测量重复性（nm）

285 k 1.0 0.01
400 k −1.5 0.01
450 k 1.3 0.01
690 k 1.4 0.00
790 k 1.4 0.01

下载: 导出CSV

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