基于光栅干涉仪的纳米位移台校准方法研究

刘丽琴; 管钰晴; 邹文哲; 郭创为; 张玉杰; 徐瑞书; 傅云霞; 雷李华

doi:10.12338/j.issn.2096-9015.2023.0114

基于光栅干涉仪的纳米位移台校准方法研究

doi: 10.12338/j.issn.2096-9015.2023.0114

刘丽琴^{1, 2,},
管钰晴^{1, 2},
邹文哲^{1, 2},
郭创为¹,
张玉杰¹,
徐瑞书¹,
傅云霞^{1, 2},
雷李华^{1, 2, ,}

1.
上海市计量测试技术研究院，上海 201203
2.
上海市在线检测与控制技术重点实验室，上海 201203

基金项目: 上海市2021年度“科技创新行动计划”自然科学基金项目（21ZR1483100）；国家重点研发计划青年科学家项目（2021YFF0603300）；上海市2021年度“科技创新行动计划”优秀学术/技术带头人项目（21XD1425000）。

详细信息

作者简介:
刘丽琴（1983-），上海市计量测试技术研究院助理工程师，研究方向：微纳米计量技术研究，邮箱：liuliqin@simt.com.cn

通讯作者:
雷李华（1985-），上海市计量测试技术研究院高级工程师，研究方向：微纳米计量技术研究，邮箱：leilh@simt.com.cn

中图分类号: TB921
计量
- 文章访问数: 448
- HTML全文浏览量: 209
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- 被引次数: 0
出版历程
- 收稿日期: 2023-04-21
- 录用日期: 2023-08-01
- 修回日期: 2023-07-27
- 网络出版日期: 2023-08-23

Study on the Calibration Method of Nano-Positioning Stages Using Grating Interferometers

LIU Liqin^{1, 2
,},
GUAN Yuqing^{1, 2},
ZOU Wenzhe^{1, 2},
GUO Chuangwei¹,
ZHANG Yujie¹,
XU Ruishu¹,
FU Yunxia^{1, 2},
LEI Lihua^{1, 2
, ,}

1.
Shanghai Institute of Measurement and Testing Technology, Shanghai, 201203, China
2.
Shanghai Key Laboratory of Online Test and Control Technology, Shanghai, 201203, China

摘要

摘要: 随着集成电路制造关键尺寸向着5 nm的节点迈进，我国集成电路检测设备产业化的呼声剧增，纳米位移台作为集成电路制造、超精密加工、精密科学仪器制造等领域检测设备的关键器件，研究人员对其重复定位精度、线性度的要求越来越高。光栅干涉仪以光栅作为标准物质溯源到长度基准，因其对环境因素的变化不敏感、抗干扰能力强、稳定性高的优点，成为微纳检测设备产业化的新方向。采用基于标准物质的光栅干涉仪，针对纳米位移台的重复定位精度、线性度分别设计了不同的校准方案，并通过实验验证方案的可行性，最后对该校准方法的测量不确定度和溯源性进行了分析，可以看出设计的校准方案测量稳定、溯源链短。
- 计量学 /
- 光栅干涉仪 /
- 标准光栅 /
- 位移校准 /
- 纳米位移台
Abstract: As the critical dimensions in integrated circuit manufacturing approach the 5nm node, the demand for the industrialization of integrated circuit testing equipment has surged. The nano-positioning stage, a pivotal component in semiconductor manufacturing, ultra-precision machining, and precision instrument manufacturing, is experiencing increasingly stringent demands for its repetitive positioning accuracy and linearity. The grating interferometer, which leverages the pitch of the grating as a reference material for measurement, showcases remarkable environmental resilience and superior stability. This makes the grating interferometer an emerging trend in the industrialization of macro-nano measurement equipment. This study presents a calibration method for the nano-positioning stage using a grating interferometer. The feasibility of this method is confirmed through experimental validations. Furthermore, an in-depth analysis of the measurement uncertainty and traceability chain is conducted, highlighting the robustness and shortened traceability path of the proposed calibration approach.
- metrology /
- grating interferometer /
- standard grating /
- displacement calibration /
- nano-positioning stage

HTML全文

图 1 光栅干涉仪原理图

Figure 1. Schematic of the grating interferometer

下载: 全尺寸图片幻灯片

图 2 基于光栅干涉仪的纳米位移台重复性校准方案

Figure 2. Calibration scheme for positioning repeatability of the nano-positioning stage using a grating interferometer

下载: 全尺寸图片幻灯片

图 3 基于光栅干涉仪的纳米位移台线性度校准方案

Figure 3. Calibration scheme for linearity of the nano-positioning stage using a grating interferometer

下载: 全尺寸图片幻灯片

图 4 重复定位精度校准实验平台

Figure 4. Experiment setup of positioning repeatability calibration system

下载: 全尺寸图片幻灯片

图 5 测量信号图

Figure 5. Measurement signal diagram

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图 6 校准实验图

Figure 6. Calibration experiment diagram

下载: 全尺寸图片幻灯片

图 7 基于光栅干涉仪的纳米位移台校准方法溯源性分析

Figure 7. Traceability analysis of the calibration method for the nano-positioning stage based on the grating interferometer

下载: 全尺寸图片幻灯片

表 1 基于标准物质的光栅干涉仪10次重复性测量结果

Table 1. Ten repetitive measurements using the grating interferometer based on a reference material /μm

序号	1	2	3	4		5	6	7	8	9	10
位移值	100.9343	100.9504	100.8810	100.8702		100.8260	100.8178	100.7467	100.7206	100.7382	100.6854
均值					100.8171
最大偏差					0.1333

下载: 导出CSV

表 2 纳米位移台线性度测量实验结果

Table 2. Linearity calibration results for the nano-positioning stage

		采样点
线性偏差 (μm)	序号	1	2	3	4	5	6	7	8	9	10
	实验1	−0.2457	−0.1305	0.01304	0.1010	0.1451	0.1250	0.0247	0.7074	−0.1947	−0.5476
	实验2	−0.2408	−0.1233	0.0211	0.0892	0.1356	0.1157	0.0646	0.6641	−0.1342	−0.6007
	实验3	−0.2664	−0.1407	−0.0069	0.0691	0.1162	0.1125	0.0386	0.6173	−0.1727	−0.6156
	实验4	−0.2481	−0.12055	0.01609	0.0929	0.1473	0.1380	0.0444	0.6985	−0.1676	−0.5741
	实验5	−0.2465	−0.1216	0.0148	0.0976	0.1355	0.1196	0.0151	0.6760	−0.1150	−0.5765
最大线性偏差均值(μm)					0.673
线性度					0.67%

下载: 导出CSV

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