Abstract: As the critical dimensions in integrated circuit manufacturing approach the 5nm node, the demand for the industrialization of integrated circuit testing equipment has surged. The nano-positioning stage, a pivotal component in semiconductor manufacturing, ultra-precision machining, and precision instrument manufacturing, is experiencing increasingly stringent demands for its repetitive positioning accuracy and linearity. The grating interferometer, which leverages the pitch of the grating as a reference material for measurement, showcases remarkable environmental resilience and superior stability. This makes the grating interferometer an emerging trend in the industrialization of macro-nano measurement equipment. This study presents a calibration method for the nano-positioning stage using a grating interferometer. The feasibility of this method is confirmed through experimental validations. Furthermore, an in-depth analysis of the measurement uncertainty and traceability chain is conducted, highlighting the robustness and shortened traceability path of the proposed calibration approach.