Study on the Calibration Method of Nano-Positioning Stages Using Grating Interferometers

As the critical dimensions in integrated circuit manufacturing approach the 5nm node, the demand for the industrialization of integrated circuit testing equipment has surged. The nano-positioning stage, a pivotal component in semiconductor manufacturing, ultra-precision machining, and precision instrument manufacturing, is experiencing increasingly stringent demands for its repetitive positioning accuracy and linearity. The grating interferometer, which leverages the pitch of the grating as a reference material for measurement, showcases remarkable environmental resilience and superior stability. This makes the grating interferometer an emerging trend in the industrialization of macro-nano measurement equipment. This study presents a calibration method for the nano-positioning stage using a grating interferometer. The feasibility of this method is confirmed through experimental validations. Furthermore, an in-depth analysis of the measurement uncertainty and traceability chain is conducted, highlighting the robustness and shortened traceability path of the proposed calibration approach.